Non-destructive microwave characterization of ferroelectric films on conductive substrates

Integrated Ferroelectrics

Volumn 60, Issue , 2004, Pages 1-19

  Rundqvist, Pär ^a   Vorobiev, Andrei ^a   Gevorgian, Spartak ^a,b   Khamchane, Khaled ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^b Ericsson Microwave Systems AB   (Sweden)

Author keywords

Accuracy analysis; Capacitor; Dielectric measurement; Microwave measurements; STO

Indexed keywords

CAPACITORS; ELECTRIC FIELDS; MICROWAVES; PERMITTIVITY;

ACCURACY ANALYSIS; CONDUCTIVE SUBSTRATES; DIELECTRIC MEASUREMENT; MICROWAVE MEASUREMENTS; STO;

FERROELECTRIC THIN FILMS;

EID: 18844393283     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580490440828     Document Type: Article

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