|
Volumn 20, Issue 6, 2005, Pages 559-562
|
SiGe δ-channel field-effect transistors on SIMOX substrates
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ELECTRIC BREAKDOWN;
ELECTRIC CONDUCTIVITY;
HOLE MOBILITY;
LEAKAGE CURRENTS;
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR QUANTUM WELLS;
SILICON ON INSULATOR TECHNOLOGY;
COULOMB SCATTERING;
DOPING DENSITY;
NEGATIVE DIFFERENTIAL RESISTANCE (NDR);
TUNNELLING CURRENT DENSITIES;
FIELD EFFECT TRANSISTORS;
|
EID: 18744411241
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/20/6/014 Document Type: Article |
Times cited : (5)
|
References (14)
|