Integrated facility of UV and IR laser process to enhance laser damage resistance of large scale 3ω optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5647, Issue , 2005, Pages 177-186

  During, Annelise ^a   Lamaignère, Laurent ^a   Bouchut, Philippe ^b   Piombini, Hervé ^c  

^a CEA CESTA   (France)

^b CEA LETI   (France)

^c CEA LE RIPAULT   (France)

Author keywords

Fused silica; KDP; Laser conditioning; Laser damage; Mitigation

Indexed keywords

CRYSTALS; EXCIMER LASERS; FUSED SILICA; INFRARED RADIATION; LASER DAMAGE; LASER PULSES; ULTRAVIOLET RADIATION; YTTRIUM COMPOUNDS;

KDP; LASER CONDITIONING; LASER DAMAGE RESISTANCE; MITIGATION;

LASER OPTICS;

EID: 18744383077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.585001     Document Type: Conference Paper

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