Design of a production process to enhance optical performance of 3ω optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5273, Issue , 2004, Pages 296-302

  Prasad, Rahul R ^a   Bruere, Justin R ^a   Halpin, John ^a   Lucero, Phil ^a   Mills, Steve ^a   Bernacil, Michael ^a   Hackel, Richard P ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Fused silica; Laser conditioning; Laser damage; Laser mitigation; Surface damage

Indexed keywords

LASER CONDITIONING; LASER MITIGATION; OPTICAL DAMAGE RESISTANCE; SURFACE DAMAGE;

CARBON DIOXIDE; EXCIMER LASERS; FUSED SILICA; IMAGING SYSTEMS; INFRARED RADIATION; PHOTOGRAPHY; VIDEO CAMERAS;

LASER DAMAGE;

EID: 5544297535     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.523857     Document Type: Conference Paper

References (4)

1. Raymond M. Brusasco, Bernie M. Penetrante, John E. Peterson, Stephen M. Maricle, Joseph A. Menapace, "UV laser conditioning for the reduction of 351-nm damage initiation in fused silica," in Laser-Induced Damage in Optical Materials: 2001, Gregory J. Exarhos, Arthur H. Guenther, Keith Lewis, M. J. Soileau and Christopher J. Stolz, eds. SPIE Vol. 4679, 48-55 (2002).
2. 2 laser treatment for mitigation of 351 nm damage growth on fused silica," in Laser-Induced Damage in Optical Materials: 2001, Gregory J. Exarhos, Arthur H. Guenther, Keith Lewis, M. J. Soileau and Christopher J. Stolz, eds. SPIE Vol. 4679, 40-47 (2002).
3. Rahul R. Prasad, Justin R. Bruere, John Peterson, John Halpin, Michael Borden and Richard P. Hackel, "Enhanced performance of large 3ω optics using UV and IR lasers," elsewhere in these proceedings.
4. Michael D. Feit and Alexander M. Rubinchek, elsewhere in these proceedings.