Dependence of threshold thickness of crystallization and film morphology on film processing conditions in poly(vinylidene fluoride-trifluoroethylene) copolymer thin films

Journal of Applied Physics

Volumn 92, Issue 6, 2002, Pages 3111-3115

  Xia, Feng ^a   Razavi, B ^a   Xu, Haisheng ^a   Cheng, Z Y ^a   Zhang, Q M ^a  

^a The Pennsylvania State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMER THIN FILMS; CRYSTALLINITIES; DIRECT LINKS; FERROELECTRIC PROPERTY; FERROELECTRIC RESPONSE; FILM MORPHOLOGY; FILM-PROCESSING CONDITIONS; FUNCTIONAL PROPERTIES; POLARIZATION SWITCHING SPEED; POLY(VINYLIDENE FLUORIDE-TRIFLUOROETHYLENE); SILICON SUBSTRATES; SPIN-CAST FILM; THICKNESS DIRECTION;

CRYSTAL MICROSTRUCTURE; ULTRATHIN FILMS;

DIELECTRIC MATERIALS;

EID: 18644374068     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1503395     Document Type: Article

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