In situ differential reflectance spectroscopy study of early stages of β-FeSi2 silicide formation

e-Journal of Surface Science and Nanotechnology

Volumn 3, Issue , 2005, Pages 113-119

  Dotsenko, Sergey Andreevich ^a   Galkin, Nickolay Gennadievich ^a   Gouralnik, Alexander Samuilovich ^a   Koval, Ludmila Valerievna ^b  

^a INSTITUTE OF AUTOMATION AND CONTROL PROCESSES   (Russian Federation)

^b FAR EASTERN FEDERAL UNIVERSITY   (Russian Federation)

Author keywords

Atomic Force Microscopy; Differential Reflectance Spectroscopy; Film growth; Iron silicide; Si(111)

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; DIELECTRIC PROPERTIES; FILM GROWTH; MATHEMATICAL MODELS; OPTICAL FIBERS; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR MATERIALS; SPECTROSCOPIC ANALYSIS;

DIELECTRIC FUNCTIONS; DIFFERENTIAL REFLECTANCE SPECTROSCOPY; IRON SILICIDE; PHOTON ENERGY;

IRON COMPOUNDS;

EID: 18544381083     PISSN: 13480391     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2005.113     Document Type: Article

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