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Volumn 377-379, Issue , 1997, Pages 856-860

Fe/Si(111) interface formation studied by photoelectron diffraction

Author keywords

Iron; Metal semiconductor interfaces; Photoelectron diffraction; Photoelectron emission; Silicides; Silicon

Indexed keywords

ANNEALING; ATOMS; DEPOSITION; ELECTRON DIFFRACTION; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; IRON; SEMICONDUCTOR METAL BOUNDARIES; SILICON; THERMAL EFFECTS;

EID: 0031120783     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01496-3     Document Type: Article
Times cited : (16)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.