Effect of iodine and cobalt on MOCVD Cu film growth

Electrochemical and Solid-State Letters

Volumn 6, Issue 10, 2003, Pages

  Ko, Y K ^a   Seo, B S ^a   Park, D S ^a   Yang, H J ^a   Lee, W H ^b   Reucroft, P J ^c   Lee, J G ^a  

^a Kookmin University   (South Korea)

^b Sejong University   (South Korea)

^c UNIVERSITY OF KENTUCKY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; COBALT; COMPOSITION EFFECTS; DEPOSITION; FILM GROWTH; GRAIN SIZE AND SHAPE; IODINE; METALLIZING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEATION; TRANSMISSION ELECTRON MICROSCOPY;

FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

COPPER;

EID: 1842832940     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1603972     Document Type: Article

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