Cautious control of industrial process variability with uncertain input and disturbance model parameters

Technometrics

Volumn 46, Issue 2, 2004, Pages 188-199

  Apley, Daniel W ^a   Kim, Jeongbae ^b  

^a Northwestern University   (United States)

^b KT Cooperation   (South Korea)

Author keywords

Cautious control; Engineering process control; Minimum variance control; Robust control; Statistical process control

Indexed keywords

CAUTIOUS CONTROL; ENGINEERING PROCESS CONTROL (EPC); EXPONENTIALLY WEIGHTED MOVING AVERAGE (EWMA) CONTROLLER; MINIMUM VARIANCE (MV) CONTROL;

CONTROLLABILITY; ERROR ANALYSIS; MATHEMATICAL MODELS; PARAMETER ESTIMATION; PROBABILITY DISTRIBUTIONS; ROBUSTNESS (CONTROL SYSTEMS); SEMICONDUCTOR MATERIALS; STATISTICAL PROCESS CONTROL;

INDUSTRIAL ENGINEERING;

EID: 1842806214     PISSN: 00401706     EISSN: None     Source Type: Trade Journal    
DOI: 10.1198/004017004000000239     Document Type: Article

References (33)

1. Anderson, B. D. O. (1985), "Adaptive Systems, Lack of Persistency of Excitation and Bursting Phenomena," Automatica, 21, 247-258.
2. Åström, K. J., and Wittenmark, B. (1990), Computer-Controlled Systems: Theory and Design (2nd ed.), Englewood Cliffs, NJ: Prentice-Hall.
3. _ (1995), Adaptive Control (2nd ed.), New York: Addison-Wesley.
4. Bodson, M. (1993), "Pseudo-Burst Phenomenon in Ideal Adaptive Systems," Automatica, 29, 929-940.
5. Box, G. E. P., Jenkins, G., and Reinsel, G. (1994), Time Series Analysis, Forecasting, and Control (3rd ed.), Englewood Cliffs, NJ: Prentice-Hall.
6. Box, G. E. P., and Kramer, T. (1992), "Statistical Process Monitoring and Feedback Adjustment - A Discussion," Technometrics, 34, 251-267.
7. Box, G. E. P., and Luceño, A. (1997), Statistical Control by Monitoring and Feedback Adjustment, New York: Wiley.
8. Box, G. E. P., and Meyer, R. D. (1993), "Finding the Active Factors in Fractional Screening Experiments," Journal of Quality Technology, 25, 94-105.
9. Carlin, B. P., and Louis, T. A. (1998), Bayes and Empirical Bayes Methods for Data Analysis, New York: Chapman & Hall/CRC.
10. Chen, A., and Guo, R. (2001), "Age-Based Double EWMA Controller and Its Application to CMP Processes," IEEE Transactions on Semiconductor Manufacturing, 14, 11-19.
11. Chipman, H. (1998), "Handling Uncertainty in Analysis of Robust Design Experiments," Journal of Quality Technology, 30, 11-17.
12. Del Castillo, E., and Hurwitz, A. M. (1997), "Run-to-Run Process Control: Literature Review and Extensions," Journal of Quality Technology, 29, 184-196.
13. Deming, W. E. (1986), Out of the Crisis, Cambridge, MA: MIT Press.
14. ∞ Control Theory, New York: Springer-Verlag.
15. Gower-Hall, A., Boning, D., Rosenthal, P., and Waldhauer, A. (2002), "Model-Based Uniformity Control for Epitaxial Silicon Deposition," IEEE Transactions on Semiconductor Manufacturing, 15, 295-309.
16. Green, M., and Limebeer, D. (1995), Linear Robust Control, Englewood Cliffs, NJ: Prentice-Hall.
17. Hamby, E. S., Kabamba, P. T., and Khargonekar, P. P. (1998), "A Probabilistic Approach to Run-to-Run Control," IEEE Transactions on Semiconductor Manufacturing, 11, 654-669.
18. Ingolfsson, A., and Sachs, E. (1993), "Stability and Sensitivity of an EWMA Controller," Journal of Quality Technology, 25, 271-287.
19. Janakiram, M., and Keats, J. B. (1998), "Combining SPC and EPC in a Hybrid Industry," Journal of Quality Technology, 30, 189-200.
20. Leang, S., Ma, S., Thompson, J., Bombay, B., and Spanos, C. (1996), "A Control System for Photolithographic Sequences," IEEE Transactions on Semiconductor Manufacturing, 9, 191-207.
21. Ljung, L. (1987), System Identification: Theory for the User, Englewood Cliffs, NJ: Prentice-Hall.
22. Luceño, A. (1998), "Performance of Discrete Feedback Adjustment Schemes With Dead Band, Under Stationary versus Nonstationary Stochastic Disturbances," Technometrics, 40, 223-233.
23. MacGregor, J. F. (1990), "A Different View of the Funnel Experiment," Journal of Quality Technology, 22, 255-259.
24. Montgomery, D. C., Keats, J. B., Runger, G. C., and Messina, W. S. (1994), "Integrating Statistical Process Control and Engineering Process Control," Journal of Quality Technology, 26, 79-87.
25. Morari, M., and Zafiriou, E. (1989), Robust Process Control, Englewood Cliffs, NJ: Prentice-Hall.
26. Radenkovic, M. S., and Michel, A. N. (1993), "Bursting Phenomena in Extended-Least Squares-Based Self-Tuning Control," in Proceedings of the American Control Conference, pp. 296-300.
27. Sachs, E., Hu, S., and Infolfsson, A. (1995), "Run by Run Process Control: Combining SPC and Feedback Control," IEEE Transactions on Semiconductor Manufacturing, 8, 26-43.
28. 2 Chart for Monitoring Feedback-Controlled Processes," IIE Transactions, 34, 1043-1053.
29. Tsung, F., Wu, H., and Nair, V. N. (1998), "On the Efficiency and Robustness of Discrete Proportional-Integral Control Schemes," Technometrics, 40, 214-222.
30. Vander Wiel, S. A. (1996), "Monitoring Processes That Wander Using Integrated Moving Average Models," Technometrics, 38, 139-151.
31. Vander Wiel, S. A., Tucker, W. T., Faltin, F. W., and Doganaksoy, N. (1992), "Algorithmic Statistical Process Control: Concepts and an Application," Technometrics, 34, 286-297.
32. Wu, C. F. J., and Hamada, M. (2000), Experiments: Planning, Analysis, and Parameter Design Optimization, New York: Wiley.
33. Zhou, K., Doyle, J. C., and Glover, K. (1996), Robust and Optimal Control, Upper Saddle River, NJ: Prentice-Hall.