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Volumn 7, Issue , 1997, Pages 356-359

Effects of constant current-stressing on reoxidized nitrided oxide (ONO) in flash memory devices

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRIC CURRENTS; FLUORINE COMPOUNDS; INTERFACES (MATERIALS); NITRIDING; OXIDES; POLYSILICON;

EID: 1842759910     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 3
    • 0030103765 scopus 로고    scopus 로고
    • Conduction mechanism of oxide-nitride-oxide film formed on the rough polycrystalline silicon surface
    • Naoto Matsuo and Akio Sasaki, "Conduction Mechanism Of Oxide-Nitride-Oxide Film Formed On The Rough Polycrystalline Silicon Surface", Solid-State Electronics, vol. 39, No. 3, 1996, pp. 337-342.
    • (1996) Solid-State Electronics , vol.39 , Issue.3 , pp. 337-342
    • Matsuo, N.1    Sasaki, A.2
  • 4
    • 0030146418 scopus 로고    scopus 로고
    • Improvement on fluorine effect under high field stress in tungsten-polycide gated metal-oxide-semiconductor field-effect transistor with oxynitride and/or reoxidized-oxynitride gate dielectric
    • May
    • Chii-Wen Chen, Yean-Kuen Fang, Kan-Yuan Lee, Jang-Cheng Hsieh, and Mong-Song Liang, "Improvement on Fluorine Effect under High Field Stress in Tungsten-Polycide Gated Metal-Oxide-Semiconductor Field-Effect Transistor with Oxynitride and/or Reoxidized-Oxynitride Gate Dielectric", Japanese Journal of Applied Physics, vol. 35, Part 1, No. 5A, May 1996, pp. 2590-2594.
    • (1996) Japanese Journal of Applied Physics , vol.35 , Issue.5 PART 1A , pp. 2590-2594
    • Chen, C.-W.1    Fang, Y.-K.2    Lee, K.-Y.3    Hsieh, J.-C.4    Liang, M.-S.5
  • 6
    • 0028422176 scopus 로고
    • 2 capacitors prior to dielectric breakdown
    • April
    • 2 Capacitors Prior to Dielectric Breakdown", Japanese Journal of Applied Physics, vol. 33, Part 1, No. 4A, April 1994, pp. 1820-1822.
    • (1994) Japanese Journal of Applied Physics , vol.33 , Issue.4 PART 1 A , pp. 1820-1822
    • Sawachi, M.1    Nishioka, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.