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Volumn 7, Issue , 1997, Pages 356-359
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Effects of constant current-stressing on reoxidized nitrided oxide (ONO) in flash memory devices
a a a b b b |
Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
DIELECTRIC MATERIALS;
ELECTRIC BREAKDOWN;
ELECTRIC CURRENTS;
FLUORINE COMPOUNDS;
INTERFACES (MATERIALS);
NITRIDING;
OXIDES;
POLYSILICON;
CONSTANT CURRENT-STRESSING;
FLASH MEMORY DEVICES;
REOXIDIZED NITRIDED OXIDE;
FLASH MEMORY;
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EID: 1842759910
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (6)
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