메뉴 건너뛰기




Volumn 9, Issue , 2001, Pages 465-468

Highly textured (111) electroless (EL) copper seed for ULSI copper metallization

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; COPPER; ELECTROLESS PLATING; METALLIC FILMS; METALLIZING; PALLADIUM; PHYSICAL VAPOR DEPOSITION; TITANIUM NITRIDE;

EID: 1842740452     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (12)
  • 2
    • 0033639735 scopus 로고    scopus 로고
    • New plating bath for electroless copper deposition on sputtered barrier layers
    • Yuri Lantasov, Roger Palmans and Karen Maex, "New Plating Bath for Electroless Copper deposition on Sputtered barrier Layers", Microelectronic Engineering, 50, 2000, pp 441-447.
    • (2000) Microelectronic Engineering , vol.50 , pp. 441-447
    • Lantasov, Y.1    Palmans, R.2    Maex, K.3
  • 3
    • 0033640032 scopus 로고    scopus 로고
    • Room temperature electroless plating copper seed layer process for damascene interlevel metal structures
    • Joseph P O Kelly, Karen F Mongey, Yveline Gobil, Joaquin Torres, Patrick V Kelly and Gabriel M Crean, "Room Temperature Electroless Plating Copper Seed Layer Process for Damascene Interlevel Metal Structures", Microelectronics Engineering, 50, 2000, pp 473-479.
    • (2000) Microelectronics Engineering , vol.50 , pp. 473-479
    • Kelly, J.P.O.1    Mongey, K.F.2    Gobil, Y.3    Torres, J.4    Kelly, P.V.5    Crean, G.M.6
  • 7
    • 0030288844 scopus 로고    scopus 로고
    • A novel seed layer scheme to protect catalytic surfaces for electroless deposition
    • Melvin J DeSilva and Y Shacham-Diamand, "A Novel Seed layer Scheme to Protect Catalytic Surfaces for Electroless Deposition", J. Electrochem Soc, Vol 143, No 11, (1996), pp 3512-3516.
    • (1996) J. Electrochem Soc , vol.143 , Issue.11 , pp. 3512-3516
    • DeSilva, M.J.1    Shacham-Diamand, Y.2
  • 12
    • 1842681320 scopus 로고    scopus 로고
    • Extendability of electrochemical deposition for high aspect ratio copper interconnects
    • (eds : P C Andricacos, P C Searson, C Reidsema Simpson, P Allongue, J L Stickney and G M Oleszek), Proceeding
    • Sergey Lopatin, "Extendability of Electrochemical Deposition for High Aspect ratio Copper Interconnects", pp 9-15, Electrochemical Proceeding in ULSI Fabrication and Semiconductor/Metal Deposition II (eds : P C Andricacos, P C Searson, C Reidsema Simpson, P Allongue, J L Stickney and G M Oleszek), Proceeding Vol 99-9.
    • Electrochemical Proceeding in ULSI Fabrication and Semiconductor/Metal Deposition II , vol.99 , Issue.9 , pp. 9-15
    • Lopatin, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.