Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography

Journal of Applied Physics

Volumn 85, Issue 8 II B, 1999, Pages 6160-6162

  Savas, T A ^a   Farhoud, M ^b   Smith, Henry I ^b   Hwang, M ^c   Ross, C A ^c  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b USA   (United States)

^c Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1842694303     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370029     Document Type: Article

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