Influence of Femtosecond Laser Parameters on Fabrication of Photomask by Direct Ablation

Lasers in Engineering

Volumn 13, Issue 1, 2003, Pages 13-23

  Stanley, P ^a   Venkatakrishnan, K ^a   Lim, L E N ^a   Ngoi, B K A ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Femtosecond laser; Micro machining; Photomask

Indexed keywords

FEMTOSECOND LASERS; PHOTOMASKS;

INTEGRATED OPTICS; LASER ABLATION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; SCANNING; SENSORS;

MASKS;

EID: 1842532620     PISSN: 08981507     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. Photomask Basics: http://www.photronics.com/
2. Fatikow S and Rembold U. (1997). Microsystem Technology and Microrobotics. Springer-Verlag, Germany, 91-96.
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4. Liu X, Du XD, Mourou G. (1997). Laser Ablation and Micromachining with Ultrashort Laser Pulses. IEEE Journal of Quantum Electronics, 33, 1706-1716.
5. Ngoi BKA, Venkatakrishnan K, Tan B, Stanley P, Lim LEN. (2001). Angular dispersion compensation for acousto-optic devices used for ultrashort-pulsed laser micromachining. Optics Express, 9, 200-206.
6. Venkatakrishnan K, Tan B, Ngoi BKA. (2001). Submicron holes in copper thin film directly ablated using femtosecond pulsed laser. Optical Engineering, 40, 2892-2893.
7. Glezer EN, Milosavljevic M, Huang L, Finlay RJ, Her TH, Callan JP, Mazur E. (1996). 3-D optical storage inside transparent materials. Optics Letters, 21 (24), 2023-2025.
8. Schaffer CB, Brodeur A, Garcia JF, Mazur E. (2001). Micromachining bulk glass using femtosecond laser pulses with nanojoule energy. Optics Letters, 26, 93-95.