Effect of concurrent N2+ and N+ ion bombardment on the plasma-assisted deposition of carbon nitride thin film

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 2, 2004, Pages 321-323

  Cao, Z X ^a   Oechsner, H ^b  

^a INSTITUTE OF PHYSICS   (China)

^b France   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; DEPOSITION; ELECTRON CYCLOTRON RESONANCE; ION BOMBARDMENT; MICROSTRUCTURE; NITROGEN; PLASMA SOURCES; THIN FILMS;

CARBON NITRIDE THIN FILMS; MOLECULAR IONS;

CARBON NITRIDE;

EID: 1842504040     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1644112     Document Type: Article

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