Interoperability beyond design: sharing knowledge between design and manufacturing

Proceedings - International Symposium on Quality Electronic Design, ISQED

Volumn 2003-January, Issue , 2003, Pages 214-219

  Cottrell, D R ^a   Grebinski, T J ^b  

^a Si2 ^*  (United States)

^b SEMI Data Path Task Force Department   (United States)

Author keywords

Application specific integrated circuits; Costs; Data models; Databases; Electronic design automation and methodology; Fabrication; Integrated circuit modeling; Integrated circuit technology; Manufacturing; Supply chains

Indexed keywords

APPLICATION PROGRAMS; APPLICATION SPECIFIC INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; COSTS; DATA STRUCTURES; DATABASE SYSTEMS; DESIGN; ELECTRONIC DESIGN AUTOMATION; FABRICATION; INTEGRATED CIRCUITS; MANUFACTURE; MASKS; SUPPLY CHAINS;

APPLICATION PROGRAM INTERFACES; COMMON DATA MODEL; ELECTRONIC DESIGN AUTOMATION AND METHODOLOGIES; INTEGRATED CIRCUIT MODELING; INTEGRATED CIRCUIT TECHNOLOGY; SHARING KNOWLEDGE; UNIVERSAL DATA MODEL; WAFER FABRICATIONS;

INTEGRATED CIRCUIT DESIGN;

EID: 34547700271     PISSN: 19483287     EISSN: 19483295     Source Type: Conference Proceeding    
DOI: 10.1109/ISQED.2003.1194734     Document Type: Conference Paper

References (7)

1. R.C. pack, et.al., GDS-3 Initiative: Advanced Design-through-Chip Infrastructure for Sub-Wavelength Technology, SPIE, 2001
2. A.B. Kahng and Y.C. Pati, Subwavelength Lithography and its Potential Impact on Design and EDA, 1999 Design Automation Conference
3. M.A. Lavin and W.C. Leipold, VLSI Manufacturing Shape Data Preparation, MicroNews, Third Quarter, 1999, Vol. 5, No. 3, IBM Corp.
4. J. Lin and B. Lin, Mask Supply Workshop, SPIE BACUS Conference , October 1, 2001
5. T.J. Grebinski, SEMI IC Design/ Photomask Data Path Task Force, BACUS, 2002
6. T.J. Grebinski, The Anatomy of a Universal Data Model, BACUS, 2001 (www.si2.org/eda-mask)
7. OpenAccess Project, www.openeda.org