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Volumn 5256, Issue 1, 2003, Pages 638-645
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Optical critical dimension (OCD) measurements for profile monitoring and control: Applications for mask inspection and fabrication
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Author keywords
ADI; AEI; Normal incidence spectroscopic ellipsometry; OCD; Scatterometry
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Indexed keywords
AFTER ETCH INSPECTION (AEI);
OPTICAL CRITICAL DIMENSION (OCD);
ANISOTROPY;
DIFFRACTION;
ELECTROMAGNETIC FIELD EFFECTS;
ELLIPSOMETRY;
ETCHING;
MASKS;
OPTICAL MICROSCOPY;
QUARTZ;
REFLECTOMETERS;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 1842474967
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (16)
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References (4)
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