Existing and envisioned control environment for semiconductor manufacturing

Run-to-Run Control in Semiconductor Manufacturing

Volumn , Issue , 2000, Pages 115-124

  Moyne, James ^a   White, Joe ^b  

^a UNIVERSITY OF MICHIGAN   (United States)

^b Crystal Semiconductor   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1842442626     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Chapter

References (12)

1. The National Technology Roadmap for Semiconductors, Semiconductor Industry Association (1997), available at www.sematech.org.
2. www.semi.org.
3. www.sematech.org.
4. SEMI International Standards: Equipment Automation/Software 1 and 2, Semiconductor Equipment and Materials International, 1999.
5. Document 3022A: Revision to SEMI E30, Addition of Application Notes for Recipe Parameter Modification, Semiconductor Equipment and Materials International, (October 1999).
6. Rumbaugh, J. et al., Object-Oriented Modeling and Design, Englewood Cliffs, NJ, Prentice Hall, 1991.
7. Moyne, J., Najafi, N., Judd, D., and Stock, A., “Analysis of Sensor/Actuator Bus Interoperability Standard Alternatives for Semiconductor Manufacturing,” Sensors Expo '94, Cleveland (September 1994).
8. SEMATECH CIM Framework Architecture Guide 1.0, SEMATECH Technology Transfer Document #97103379A-ENG (1997).
9. SEMATECH Advanced Process Control Framework Initiative (APCFI) Project:Detailed System Description, SEMATECH Technology Transfer Document #99053736A-TR (1999).
10. SEMATECH Control Systems Requirements Specification V2.0, SEMATECH Technology Transfer Document #96123222B-ENG (December 1997).
11. CIM Global Joint Guidance for 300 mm Semiconductor Factories, Release One, International 300-mm Initiative (I300I) and Japan 300-mm Semiconductor Technology Conference (J300) (December 1997).
12. Moyne, J., Etemad, H., and Elta, M., “Run-to-Run Control Framework for VLSI Manufacturing, Microelectronic Processing '93 Conference Proceedings (September 1993).