Fully micromachined finite-ground coplanar line-to-waveguide transitions for W-band applications

IEEE Transactions on Microwave Theory and Techniques

Volumn 52, Issue 3, 2004, Pages 1001-1007

  Lee, Yongshik ^a   Becker, James P ^b   East, Jack R ^a   Katehi, Linda P B ^c  

^a UNIVERSITY OF MICHIGAN   (United States)

^b Idaho National Laboratory   (United States)

^c PURDUE UNIVERSITY   (United States)

Author keywords

Deep reactive ion etching (DRIE); Finite ground coplanar (FGC) waveguide; Micromachined waveguide; Micromachining; Waveguide transition

Indexed keywords

MICROMACHINING; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; WAVEGUIDES;

DEEP REACTIVE ION ETCHING; FINITE GROUND COPLANAR WAVEGUIDE; MICROMACHINED WAVEGUIDE; WAVEGUIDE TRANSITION;

MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;

EID: 1842422838     PISSN: 00189480     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMTT.2004.823580     Document Type: Article

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