Knack for reticle cleaning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 409-415

  Takahashi, Masumi ^a   Handa, Hitoshi ^a   Shirai, Hisatsugu ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; CONTAMINATION; INTEGRATED CIRCUIT MANUFACTURE; PARTICLES (PARTICULATE MATTER); QUALITY CONTROL;

CHEMICAL TREATMENT; CLEANERS; KNACK; RETICLE CLEANING; RINSE SEQUENCE;

MASKS;

EID: 0033671949     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392043     Document Type: Conference Paper

References (2)