Mechanism of and defect formation in the self-assembly of polymeric polycation-montmorillonite ultrathin films

Journal of the American Chemical Society

Volumn 119, Issue 29, 1997, Pages 6821-6832

  Kotov, N A ^a,b   Haraszti, T ^c   Turi, L ^c   Zavala, G ^b   Geer, R E ^d   Dekany I ^c   Fendler, J H ^b  

^a OKLAHOMA STATE UNIVERSITY   (United States)

^b SYRACUSE UNIVERSITY   (United States)

^c UNIVERSITY OF SZEGED   (Hungary)

^d STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; DEFECTS; ELECTRIC FIELD EFFECTS; MORPHOLOGY; ORGANIC POLYMERS; SURFACE PHENOMENA; SURFACE TREATMENT; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DEFECT FORMATION; POLYMERIC POLYCATION MONTMORILLONITE; SELF ASSEMBLED FILMS; SURFACE PLASMON SPECTROSCOPIC MEASUREMENT; X RAY REFLECTIVITY;

ULTRATHIN FILMS;

MONTMORILLONITE; POLYCATION;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; FILM; LIGHT SCATTERING; SURFACE PROPERTY; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

EID: 1842330357     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja964409t     Document Type: Article

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