Microcrystalline diamond deposition on a porous silicon host matrix

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 69, Issue , 2000, Pages 171-176

  Baranauskas, V ^a,b   Tosin, M C ^a   Peterlevitz, A C ^a   Ceragioli, H J ^a   Durrant, S F ^a  

^a Faculdade de Engenharia   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; FILM GROWTH; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; NUCLEATION; POROSITY; POROUS SILICON; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; THICK FILMS;

CROSS-SECTIONAL ANALYSIS; HOT-FILAMENT REACTORS; MICROCRYSTALLINE DIAMOND DEPOSITION;

SILICON WAFERS;

EID: 0033896302     PISSN: 09215107     EISSN: None     Source Type: None    
DOI: 10.1016/S0921-5107(99)00255-X     Document Type: Article

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