Decontamination process using cf4-o2 microwave discharge plasma at atmospheric pressure

Journal of Nuclear Science and Technology

Volumn 37, Issue 9, 2000, Pages 787-792

  Wind arto, Hendri Firman ^a   Matsumoto, Takeshi ^a   Akatsuka, Hiroshi ^a   Suzuki, Masaaki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atmospheric pressure plasma; Decontamination; Efficiency; Feasibility studies; Fluorination; Microwave discharge plasma; Plasma process

Indexed keywords

ATMOSPHERIC PRESSURE; COMPUTATIONAL METHODS; FLUORINE COMPOUNDS; PLASMA SOURCES; PLATES (STRUCTURAL COMPONENTS); RADIATION DECONTAMINATION; STAINLESS STEEL; THERMODYNAMIC STABILITY;

MICROWAVE DISCHARGE PLASMAS;

NUCLEAR PHYSICS;

EID: 0034266504     PISSN: 00223131     EISSN: None     Source Type: Journal    
DOI: 10.1080/18811248.2000.9714957     Document Type: Article

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