Removal of oxide film prepared under bwr condition by using atmospheric cf4/o2 plasma decontamination process

Journal of Nuclear Science and Technology

Volumn 37, Issue 10, 2000, Pages 913-918

  Windarto, Hendri Firman ^a   Matsumoto, Takeshi ^a   Akatsuka, Hiroshi ^a   Sakagishi, Kohji ^b   Suzuki, Masaaki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b AT OX Co Ltd   (Japan)

Author keywords

Atmospheric pressure plasma; Decontamination; Feasibility studies; Fluorination; Microwave plasma; Plasma process; Removal

Indexed keywords

ATOMS; CHEMICAL REACTIONS; DECONTAMINATION; DENSITY (SPECIFIC GRAVITY); FILMS; FLUORINE; ORGANIC COMPOUNDS; OXIDES; OXYGEN; PLASMA APPLICATIONS; PRESSURE; REMOVAL;

FEASIBILITY; FLUORINATION; OXIDE FILM; PLASMA DECONTAMINATION PROCESS; PLASMA IRRADIATION;

BOILING WATER REACTORS;

EID: 0034291334     PISSN: 00223131     EISSN: None     Source Type: Journal    
DOI: 10.1080/18811248.2000.9714972     Document Type: Article

References (10)

1. Honda, T., et al.: Nucl. Technol., 64, 35 (1984).
2. Uchida, S., et al.: Nucl. Sci. Eng., 77, 496 (1981).
3. Lin, C. C., Smith, F. R., Cowan, R. L.: Nucl. Eng. Des., 166, 31-36 (1996).
4. Winkler, R., et al.: Nucl. Eng. Des., 166, 37-46 (1996).
5. Tatenuma, K., et al: Nucl. Technol., 124, 147 (1998).
6. Windarto, H. F., et al: Decontamination process using CF4-O2 microwave discharge plasma at atmospheric pressure, J. Nucl. Sci. Technol., 37[9], 787 (2000).
7. Suzuki, M., et al: J. Nucl Sci. Technol., 34 [12], 1159 (1997).
8. Suzuki, M., et al: Proc. Asia-Pasific Conf. On Plasma Sci. Technol, B6-3, 417 (1996).
9. Nicholls, D.: uThe Chemistry of Iron, Cobalt and Nickel”, (1st ed.), Pergamon Press, Vol. 24, 1053-1107 (1973).
10. Erickson, G., Hack, K.: Metall. Trans. B, 21B, 1013 (1990).