SCOPUS 정보 검색 플랫폼

Journal of Power Sources

Volumn 103, Issue 1, 2001, Pages 134-139

The influence of target history and deposition geometry on RF magnetron sputtered LiCoO2 thin films

(3) Whitacre, J F a West, W C a Ratnakumar, B V a

a CALIFORNIA INSTITUTE OF TECHNOLOGY (United States)

Author keywords

RF magnetron sputtering; Rutherfords backscattering spectrometry; Thin LiCoO2 films

Indexed keywords

CATHODES; GRAIN SIZE AND SHAPE; LITHIUM COMPOUNDS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

SOLID-STATE BATTERIES;

THIN FILMS;

EID: 0035977389 PISSN: 03787753 EISSN: None Source Type: Journal
DOI: 10.1016/S0378-7753(01)00849-7 Document Type: Article

Times cited : (33)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.