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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 8, 2001, Pages 4819-4824

Effect of gas composition on TiN thin-film fabrication in N2/H2/Ar/TiCl4 inductively coupled plasma-enhanced chemical vapor deposition system

(2) Jang, S S a Lee, W J a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

ICP; Langmuir probe; Mass spectrometry; PECVD; TiN

Indexed keywords

ELECTRIC PROPERTIES; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TITANIUM NITRIDE;

LANGMUIR SINGLE PROBES;

THIN FILMS;

EID: 0035414955 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.4819 Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.