Charge and charging compensation on oxides and hydroxides in oxygen environmental SEM

Ultramicroscopy

Volumn 103, Issue 3, 2005, Pages 191-198

  Ji, Y ^a   Guo, H S ^a   Zhong, T X ^a   Zhang, H ^a   Quan, X L ^a   Zhang, Y Q ^a   Xu, X D ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Charge effect; ESEM; Oxygen environment; SEM

Indexed keywords

ELECTRIC CHARGE; ELECTRON BEAMS; INSULATING MATERIALS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; WATER;

CHARGING COMPENSATIONS; CHARGING EFFECTS; CHARGING PROCESSES; OXYGEN ATMOSPHERE;

OXYGEN;

HYDROXIDE; OXIDE; OXYGEN;

ARTICLE; ATMOSPHERE; ELECTRON BEAM; MECHANICAL PROBE; PRESSURE; SCANNING ELECTRON MICROSCOPY;

EID: 17844395171     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2004.12.001     Document Type: Article

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