Characterization of Nanocrystalline Silicon Film grown by LEPECVD for Photovoltaic Applications

Materials Research Society Symposium - Proceedings

Volumn 762, Issue , 2003, Pages 565-570

  Bollani, M ^a   Binetti, S ^a   Acciarri, M ^a   Fumagalli, L ^a   Arcari, A ^a   Pizzini, S ^a   Von Kanel H ^b  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b POLITECNICO DI MILANO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; DOPING (ADDITIVES); FILM GROWTH; NANOSTRUCTURED MATERIALS; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SILICON SOLAR CELLS; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION;

ION INDUCED DAMAGES; LOW ION ENERGIES;

THIN FILMS;

EID: 1642479925     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-762-a5.3     Document Type: Conference Paper

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