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Volumn 87, Issue 1-4, 2005, Pages 311-316
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Measurement of residual stress in EFG ribbons using a phase-shifting IR photoelastic method
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Author keywords
EFG; Photoelasticity; Residual stress; Silicon ribbons
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Indexed keywords
BUCKLING;
GRAIN BOUNDARIES;
INFRARED RADIATION;
LIGHT PROPAGATION;
PHASE SHIFT;
PHOTOELASTICITY;
PHOTOVOLTAIC EFFECTS;
RESIDUAL STRESSES;
SEMICONDUCTOR GROWTH;
SOLAR CELLS;
EFG;
PHOTOELASTIC COEFFICIENTS;
SILICON RIBBONS;
TEMPERATURE FIELDS;
SILICON WAFERS;
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EID: 17644422186
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solmat.2004.07.028 Document Type: Conference Paper |
Times cited : (13)
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References (17)
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