Selective metal electrodeposition through doping modulation of semiconductor surfaces

Applied Physics Letters

Volumn 86, Issue 13, 2005, Pages 1-3

  Scheck, Christian ^a   Evans, Paul ^a   Schad, Rainer ^a   Zangari, Giovanni ^b   Sorba, Lucia ^c,d   Biasiol, Giorgio ^c   Heun, Stefan ^c,e  

^a UNIVERSITY OF ALABAMA   (United States)

^b UNIVERSITY OF VIRGINIA   (United States)

^c LABORATORIO TASC   (Italy)

^d UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^e SINCROTRONE TRIESTE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; COBALT; ELECTROLYTES; INTERFACES (MATERIALS); SCHOTTKY BARRIER DIODES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DOPING; SURFACE CHEMISTRY;

CATHODIC POTENTIAL; ELECTRON TRANSFER; SEMICONDUCTOR SURFACES; SUBSTRATE DOPING;

ELECTRODEPOSITION;

EID: 17644382954     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1896086     Document Type: Article

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