Effect of ion irradiation on the optical properties and room temperature oxidation of copper surface

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 453-456

  Poperenko, L V ^a   Shaaban, Essam Ramadan ^b,c   Khanh N Q ^b   Stashchuk, V S ^a   Vinnichenko, M V ^a   Yurgelevich, I V ^a   Nosach, D V ^a   Lohner, T ^b  

^a TARAS SHEVCHENKO NATIONAL UNIVERSITY OF KYIV   (Ukraine)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^c Al Azhar University   (Egypt)

Author keywords

Copper; Ellipsometry; Ion beam analysis; Ion implantation

Indexed keywords

ALUMINUM; COPPER; ELLIPSOMETRY; EVAPORATION; ION BEAMS; ION IMPLANTATION; OXIDATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; SPECTRUM ANALYSIS; SPUTTERING;

ION BEAM ANALYSIS; ION IRRADIATION; MULTILAYER STRUCTURES; SINGLE WAVELENGTH ELLIPSOMETRY (SWE);

OPTICAL FILMS;

EID: 17144469304     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.013     Document Type: Conference Paper

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