Integrated rotating-compensator polarimeter for real-time measurements and analysis of organometallic chemical vapor deposition

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 639-644

  Flock, K ^a   Kim, S J ^a   Asar, M ^a   Kim, I K ^a   Aspnes, D E ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

Ellipsometry; GaSb; Heteroepitaxial growth; Organometallic chemical vapor deposition; Rotating compensator rotating sample spectroscopic polarimeter

Indexed keywords

ANISOTROPY; COMPOSITION; DEPOSITION; DIELECTRIC PROPERTIES; EPITAXIAL GROWTH; FOURIER TRANSFORMS; INTERFEROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PROBLEM SOLVING; RANDOM PROCESSES; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE CHEMISTRY;

GASB; HETEROEPITAXIAL GROWTH; ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION; ROTATING-COMPENSATOR ROTATING-SAMPLE SPECTROSCOPY POLARIMETER;

POLARIMETERS;

EID: 17144453217     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.01.069     Document Type: Conference Paper

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