Surface and bulk absorption in CaF2 at 193 and 157 nm

Optics Communications

Volumn 249, Issue 1-3, 2005, Pages 319-328

  Gorling Ch ^a,b   Leinhos, U ^a   Mann, K ^a,b  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^b VOLKSWAGEN AG   (Germany)

Author keywords

CaF2; DUV VUV laser calorimetry; Next generation lithography; Single and two photon absorption coefficients; Surface and bulk absorption

Indexed keywords

CRYSTALS; ENERGY GAP; EXCIMER LASERS; FLUORSPAR; LITHOGRAPHY; MATHEMATICAL MODELS; PHOTONS; POLISHING;

DUV/VUV LASER CALORIMETRY; NEXT GENERATION LITHOGRAPHY; SINGLE- AND TWO-PHOTON ABSORPTION COEFFICIENTS; SURFACE AND BULK ABSORPTION;

LIGHT ABSORPTION;

EID: 17144389924     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2005.01.027     Document Type: Article

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