Growth, structure, and properties of all-epitaxial ferroelectric (Bi,La)4 Ti3 O12 Pb (Zr0.4 Ti0.6) O3 (Bi,La)4 Ti3 O12 trilayered thin films on SrRu O3 -covered SrTi O3 (011) substrates

Applied Physics Letters

Volumn 86, Issue 8, 2005, Pages 1-3

  Bao, Dinghua ^a,b   Lee, Sung Kyun ^a   Zhu, Xinhua ^a   Alexe, Marin ^a   Hesse, Dietrich ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b SUN YAT SEN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLOGRAPHY; ELECTROMAGNETIC WAVE POLARIZATION; EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; PULSED LASER DEPOSITION; SUBSTRATES; X RAY DIFFRACTION;

FERROELECTRIC FILMS; FERROELECTRIC MEMORY DEVICES; FERROELECTRIC TESTERS; TRILAYERS;

THIN FILMS;

EID: 17044425044     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1864248     Document Type: Article

References (17)

1. J. F. Scott and C. A. Paz de Araujo, Science 246, 1400 (1989).
2. B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee, and W. Jo, Nature (London) 401, 682 (1999).
3. O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today 51, 22 (1998).
4. H. N. Lee, D. Hesse, N. Zakharov, and U. Gösele, Science 296, 2006 (2002).
5. L. Kim, D. Jung, J. Kim, Y. S. Kim, and J. Lee, Appl. Phys. Lett. 82, 2118 (2003).
6. J. C. Jiang, X. Q. Pan, W. Tian, C. D. Theis, and D. G. Schlom, Appl. Phys. Lett. 74, 2851 (1999).
7. J. V. Mantese, N. W. Schubring, A. L. Micheli, A. B. Catalan, M. S. Mohammed, R. Naik, and G. W. Auner, Appl. Phys. Lett. 71, 2047 (1997).
8. D. H. Bao, N. Wakiya, K. Shinozaki, N. Mizutani, and X. Yao, J. Appl. Phys. 90, 506 (2001).
9. J. V. Mantese, N. W. Schubring, A. L. Micheli, M. P. Thompson, R. Naik, G. W. Auner, I. B. Misirlioglu, and S. P. Alpay, Appl. Phys. Lett. 81, 1068 (2002).
10. D. H. Bao, N. Mizutani, X. Yao, and L. Y. Zhang, Appl. Phys. Lett. 77, 1041 (2000).
11. D. H. Bao, N. Wakiya, K. Shinozaki, and N. Mizutani, J. Phys. D 35, L1 (2002).
12. F. Yan, Y. N. Wang, H. L. W. Chan, and C. L. Choy, Appl. Phys. Lett. 82, 4325 (2003).
13. H. N. Lee and D. Hesse, Appl. Phys. Lett. 80, 1040 (2002).
14. T. Sakai, T. Watanabe, H. Funakubo, K. Aaito, and M. Osada, Jpn. J. Appl. Phys., Part 1 42, 166 (2003).
15. X. H. Zhu, D. H. Bao, M. Alexe, and D. Hesse, accepted by Appl. Phys. A: Mater. Sci. Process. Published online, DOI: 10.1007/s00339-004-3111-2.
16. W. B. Wu, K. H. Wong, C. L. Choy, and Y. H. Zhang, Appl. Phys. Lett. 77, 3441 (2000).
17. H. N. Lee, A. Visinoiu, S. Senz, C. Harnagea, A. Pignolet, D. Hesse, and U. Gösele, J. Appl. Phys. 88, 6658 (2000).