Stress effects on ferroelectric and fatigue properties of Nd- and La-doped Bi4 Ti3 O12 thin films

Applied Physics Letters

Volumn 86, Issue 9, 2005, Pages 1-3

  Wu, Xiumei ^a   Lu, Xiaomei ^a   Chen, Aiping ^a   Yin, Yuan ^a   Ma, Jun ^a   Li, Wei ^a   Kan, Yi ^a   Qian, Dong ^a   Zhu, Jinsong ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; CRACKS; DOPING (ADDITIVES); ELECTRIC FIELDS; EPITAXIAL GROWTH; FERROELECTRICITY; LATTICE CONSTANTS; POLARIZATION; SINGLE CRYSTALS; TENSILE STRESS; X RAY DIFFRACTION ANALYSIS;

FATIGUE PROPERTIES; FERROELECTRIC MEASUREMENT; FERROELECTRIC PROPERTIES; THERMODYNAMIC THEORY;

THIN FILMS;

EID: 17044412185     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1873063     Document Type: Article

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