Relative calibration mode for compositional depth profiling in GD-OES

Journal of Analytical Atomic Spectrometry

Volumn 19, Issue 10, 2004, Pages 1354-1360

  Nelis, Thomas ^a,b   Aeberhard, Max ^a   Payling, Richard ^a,c   Michler, Johann ^a   Chapon, Patrick ^d  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b Atout and Progrès ^*  (France)

^c UNIVERSITY OF NEWCASTLE   (Australia)

^d ISA Jobin Yvon   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CALIBRATION; COMPOSITION EFFECTS; MULTILAYERS; SPUTTERING; STANDARDS;

COMPOSITIONAL DEPTH; OPTICAL EMISSION SPECTROSCOPY; SPUTTERED MATERIALS; SPUTTERING RATE;

EMISSION SPECTROSCOPY;

EID: 17044397329     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b406187j     Document Type: Article

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