Emission yield for quantitative depth profile analysis by glow discharge optical emission-the influence of discharge parameters: Invited lecture

Journal of Analytical Atomic Spectrometry

Volumn 13, Issue 5, 1998, Pages 437-441

  Bengtson, Arne ^a   Hänström, Sofia ^a  

^a SWEREA KIMAB   (Sweden)

Author keywords

Depth profiling; Discharge parameters; Emission yield; Glow discharge; Optical emission spectrometry; Quantification

Indexed keywords

ALUMINUM; BRASS; COMPUTER SOFTWARE; ELECTRIC CURRENTS; EMISSION SPECTROSCOPY; LIGHT EMISSION; PRESSURE EFFECTS; REGRESSION ANALYSIS; STEEL;

DEPTH PROFILING; GLOW DISCHARGE OPTICAL EMISSION;

GLOW DISCHARGES;

EID: 0032074083     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/A708466H     Document Type: Article

References (9)

1. Takadoum, J., Pirrin, J. C., Pons-Corbeau, J., Berneron, R., and Charbonnier, J. C., Surf. Interface Anal., 1984, 6, 174.
2. Takimoto, K., Nishizaka, K., Suzuki, K., and Ohtsubo. T., Nippon Steel Tech. Rep., 1987, 33, 28.
3. Bengtson, A., Eklund, A., Lundholm, M., and Saric, A., J. Anal. At. Spectrom., 1990, 5, 563.
4. Payling, R., and Jones, D., Surf. Interface Anal., 1993, 20, 787.
5. Dogan, M., Laqua, K., and Massmann, H., Spectrochim. Acta, Part B, 1971, 26, 631.
6. Payling, R., Surf. Interface Anal., 1994, 21, 785.
7. Grimm, W., Spectrochim. Acta, Part B, 1968, 23, 443.
8. Boumans, P. W. J. M., Anal. Chem., 1972, 44, 1219.
9. Payling, R., Surf. Interface Anal, 1995, 23, 12.