SCOPUS 정보 검색 플랫폼

Materials Science Forum

Volumn 475-479, Issue II, 2005, Pages 1219-1222

Preparation of rutile and anatase TiO2 films by MOCVD

(2) Tu, Rong a Goto, Takashi a

a TOHOKU UNIVERSITY (Japan)

Author keywords

Anatase; Deposition rate; MOCVD; Morphology; Rutile; Titanium dioxide film

Indexed keywords

CATALYSTS; CHEMICAL REACTORS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PHOTOCATALYSIS; SCANNING ELECTRON MICROSCOPY; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DEPOSITION RATES; PHOTOCATALYSTS; PHOTOELECTRODES; RUTILE; TITANIUM OXIDE FILMS;

METALLIC FILMS;

EID: 17044376671 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/0-87849-960-1.1219 Document Type: Conference Paper

Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.