Photoluminescence of SnO2 films prepared by APCVD

Materials Science Forum

Volumn 475-479, Issue V, 2005, Pages 3701-3704

  Ji, Feng ^a   Ma, Jin ^a   Wang, Yuheng ^a   Ma, Honglei ^a   Yu, Xihu ^a   Zong, Fujian ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

APCVD; Photoluminescence; SnO2

Indexed keywords

ANNEALING; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; POLYCRYSTALS; RUTHENIUM COMPOUNDS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ATMOSPHERE PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD); BAND GAP MATERIALS; RUTILE PHASES; SNO2;

SEMICONDUCTING TIN COMPOUNDS;

EID: 17044365042     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-960-1.3701     Document Type: Conference Paper

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