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Volumn 95-96, Issue , 2004, Pages 473-482
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Precise Measurement of Ge Depth Profiles in SiGe HBT's - A Comparison of Different Methods
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Author keywords
AES; Epitaxial Layer; SiGe HBT; SIMS; Spectroscopic Ellipsometry; TEM; XRD; XRR
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Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
CHEMICAL VAPOR DEPOSITION;
DISLOCATIONS (CRYSTALS);
ELLIPSOMETRY;
HETEROJUNCTION BIPOLAR TRANSISTORS;
INTERFACES (MATERIALS);
MOLECULAR BEAM EPITAXY;
NONDESTRUCTIVE EXAMINATION;
REFLECTOMETERS;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTING GERMANIUM;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
ROCKING CURVES (RC);
STATISTICAL INTENSITY FLUCTUATIONS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 1642556978
PISSN: 10120394
EISSN: None
Source Type: Book Series
DOI: None Document Type: Conference Paper |
Times cited : (13)
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References (9)
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