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Volumn 95-96, Issue , 2004, Pages 473-482

Precise Measurement of Ge Depth Profiles in SiGe HBT's - A Comparison of Different Methods

Author keywords

AES; Epitaxial Layer; SiGe HBT; SIMS; Spectroscopic Ellipsometry; TEM; XRD; XRR

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DISLOCATIONS (CRYSTALS); ELLIPSOMETRY; HETEROJUNCTION BIPOLAR TRANSISTORS; INTERFACES (MATERIALS); MOLECULAR BEAM EPITAXY; NONDESTRUCTIVE EXAMINATION; REFLECTOMETERS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING GERMANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 1642556978     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper
Times cited : (13)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.