Evaluation of 193nm Alternating Aperture Phase Shift Mask Dry Etch Processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 253-263

  Plumhoff, J ^a   Constantine, C ^a   Shin, J ^a   Reelfs, B ^a   Rausa, E ^a   Benz, J ^b   Hibbs, M ^b   Brunner, T ^b  

^a Unaxis USA Inc   (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; DRY ETCHING; ELECTROMAGNETIC FIELDS; PHASE SHIFT; QUARTZ; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; TOOLS;

ALTERNATING APERTURE PHASE SHIFT MASKS; MICROTRENCHING; QUARTZ ETCHING;

MASKS;

EID: 1642555737     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504198     Document Type: Conference Paper

References (7)

1. T. Pistor and A. Wong, Tempest Version 6.0, University of California, Berkeley, June 2000
2. M. Burkhart, R. Gordon, M. Hibbs, and T. A. Brunner, "Through Pitch Correction of Scattering Effects in 193 nm Alternating Phase Shift Masks," Proc. SPIE Vol. 4691, 348-358 (2002)
3. C. Constantine, L. Heckerd, "ICP Quartz Etch Uniformity Improvement for Phase Shift Mask Fabrication," Proc. SPIE Vol. 3412, 220-227 (1998)
4. R. Westerman, C. Constantine, J. Plumhoff, C. Strawn, "Plasma Etching of Quartz for the Fabrication of Alternating Aperture Phase Shift Photomasks: Etch Rate Uniformity Study Utilizing a Next Generation ICP Source," Proc. SPIE Vol. 4186, 316-324 (2000)
5. H-M Wu, L He, J. Farnsworth, G. Liu, "CF4/O2 Plasma Simulation and Comparison with Quartz Etch Experiment," Proc. SPIE Vol. 4409, 409-417 (2001)
6. C. Strawn, C. Constantine, J. Plumhoff, R. Westerman "Investigation of Quartz Etch Rate Uniformity for Alternating Aperture Phase Shift Mask Applications Utilizing a Next Generation ICP Source," Proc. SPIE Vol. 4349, 23-31 (2001)
7. J. Shin, C. Constantine, J. Plumhoff, E. Rausa, "Improving Feature Size Linearity for Alternating Phase Shift Mask Applications Utilizing a Next-Generation ICP Source," Proc. SPIE Vol. 4889, 679-683 (2002)