CF4/O2 plasma simulation and comparison with quartz etch experiment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 409-417

  Wu, Han Ming ^a   He, Long ^a   Farnsworth, Jeff ^a   Liu, Gang ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE; ION BEAM LITHOGRAPHY; MATHEMATICAL MODELS; OPTIMIZATION; PLASMA SIMULATION;

AXISYMMETRIC SIMULATION; MASS FLOW RATE; NEGATIVE ION DENSITY;

INDUCTIVELY COUPLED PLASMA;

EID: 0035189674     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438386     Document Type: Article

References (4)