Morphological Evolution of ZnO Thin Films Deposited by Reactive Sputtering

Crystal Growth and Design

Volumn 4, Issue 1, 2004, Pages 147-156

  Mirica, Eugenia ^a   Kowach, Glen ^b   Evans, Paul ^c   Du, Henry ^a  

^a STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PLATINUM; SILICON; ZINC OXIDE;

ARTICLE; CHEMICAL STRUCTURE; CRYSTALLIZATION; DIFFUSION; FILM; MICROWAVE OVEN; ROOM TEMPERATURE; X RAY DIFFRACTION;

EID: 1642538243     PISSN: 15287483     EISSN: None     Source Type: Journal    
DOI: 10.1021/cg025595j     Document Type: Article

References (36)

1. Schropp, R. E. I.; Madan, A. J. Appl. Phys. 1989, 66 (5), 2027-2031.
2. Heideman, R. G.; Lambeck, P. V.; Gardeniers, J. G. E. Opt. Mater. 1995, 4 (6), 741.
3. Penza, M.; Martucci, C.; Anisimkin, V. I.; Vasanelli, L. Mater. Sci. Forum 1996, 203, 137.
4. Hutchins, M. G. C. Figures, In Energy and Environment; Pergamon: Oxford, 1990; 3, 1398.
5. Sang, B.; Yamada, A.; Konagai, M. Jpn. J. Appl. Phys. 1998, 37 (2B), L206.
6. Purica, M.; Budianu, E.; Rusu, E. Microelectron. Eng. 2000, 51-52 (1-4), 425.
7. Huang, M.; Mao, S.; Feick, H.; Yan, H.; Wu, Y.; Kind, H.; Weber, E.; Russo, R.; Yang, P. Science 2001, 292, 1897.
8. Ohmoto, A.; Kawasaki, M. IEICE Trans. Electron. 2000, E83-C (10), 1614.
9. Emanetoglu, N. W.; Gorla, C.; Liu, Y.; Liang, S.; Lu, Y. Mater. Sci Semicond. Proc. 1999, 2, 247.
10. Von Pressing, F. J.; Zeng, H.; Kim, E. S. Smart Mater. Struct. 1998, 7, 396.
11. Martin, P. M.; Good, M. S.; Johnson, J. W.; Posakony, G. J.; Bond, L. J. ; Crawford, S. L. Thin Solid Films 2000, 379, 253.
12. D. F. Nelson, D. F. Landolt-Bornstein: Low-Frequency Properties of Dielectric Crystals; Springer-Verlag: Berlin, 1993; p 107.
13. Kamiya, T. Jpn. J. Appl. Phys. 1996, 35, 4421.
14. Yoshino, Y.; Inoue, K.; Takeuchi, M.; Ohwada, K. Vacuum 1998, 51 (4), 601.
15. Fujimara, N.; Goto, S.; Itoa, T. Mater. Res. Soc. Symp. Proc. 1992, 263, 187.
16. Verghese, P. M.; Clarke, D. R. J. Mater. Res. 1999, 14 (3), 1039.
17. Commercial equipment is identified to adequately describe the experimental procedure; this does not imply a recommendation or endorsement by NIST, nor does it imply that the equipment is necessarily the best available for the purpose.
18. Vaudin, M. D.; Rupich, M. W.; Jowett, M.; Riley, G. N.; Bingert, J. F. J. Mater. Res. 1998, 13, 2910 (software download available at http://www.ceramics. nist.gov/web-book/TexturePlus/texture.htm).
19. Vaudin, M. D.; 12th International Conference on Texture of Materials; National Research Council of Canada Research Press: Ottawa, 1999; pp 186-191.
20. Kingery, W. D.; Bowen, H. K.; Uhlmann, D. R. Introduction to Ceramics, 2nd ed.; John Wiley & Sons: 1976; p 212.
21. Williams, D. B.; Carter, C. B. Transmission Electron Microscopy III - Imaging; Plenum Press: New York, 1996.
22. Romig, A. D. In Analytical Transmission Electron Microscopy, ASM Handbook; Whan, R. E., Ed.; ASM International, Materials Park, OH, 1986; Vol. 10, p 429.
23. Lamont, L. T., Jr.; Turner, F. T. J. Vac. Sci. Technol. 1974, 11 (1), 47.
24. Mo, Y.-W.; Kleiner, J.; Webb, M. B.; Lagally, M. G. Surf. Sci. 1992, 268, 275.
25. Ceh, M.; Kolar, D. J. Mater. Sci. 1989, 24 (12), 4307.
26. Sajgalik, P.; Panek, Z.; Uhrik, M. J. Mater. Sci. 1987, 22 (12), 4460.
27. Tomlins, G. W.; Routbort, J. L.; Mason, T. O. J. Am. Ceram. Soc. 1998, 81 (4), 869.
28. Vold, M. J. J. Colloid Sci. 1959, 14, 168.
29. Ramanlal, P.; Sander, L. M. Phys. Rev. Lett. 1985, 54 (6), 1828.
30. Ohring, M. The Materials Science of Thin Films; Academic Press: New York, 1992.
31. Smith, D. A.; Ibrahim, A. Mater. Res. Soc. Symp. Proc. 1994, 317, 401.
32. Li, W.-J.; Shi, E.-W.; Zhong, W.-Z.; Yin, Z.-W. J. Cryst. Growth 1999, 203, 186.
33. Blakely, J. M. Introduction to the Properties of Crystal Surfaces; Pergamon Press Inc.: New York, 1973; p 15.
34. Frost, H. J.; Thompson, C. V. J. Electron. Mater. 1988, 17 (5), 447.
35. Matsuoka, M.; Ono, K. Appl. Phys. Lett. 1988, 53, 1393.
36. Barna, P. B.; Adamik, M. Science and Technology of Thin Films; World Scientific Publishing Co. Pte. Ltd.: Singapore, 1995; p 1.