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Volumn 10, Issue 4, 2003, Pages 417-428

An analysis and MIMO extension of a double EWMA run-to-run controller for non-squared systems

Author keywords

Engineering process control; EWMA controller; Process adjustment; Semiconductor manufacturing control

Indexed keywords

ALGORITHMS; FORECASTING; MATRIX ALGEBRA; PROCESS CONTROL; QUALITY CONTROL; REGRESSION ANALYSIS; ROBUSTNESS (CONTROL SYSTEMS); STATISTICS; VECTORS;

EID: 1642495590     PISSN: 02185393     EISSN: None     Source Type: Journal    
DOI: 10.1142/S021853930300124X     Document Type: Review
Times cited : (29)

References (9)
  • 1
    • 0028425441 scopus 로고
    • Supervisory run-to-run control of a polysilicon gate etch using in situ ellipsometry
    • S. W. Butler and J. A. Stefani, "Supervisory run-to-run control of a polysilicon gate etch using in situ ellipsometry," IEEE Transactions on Semiconductor Manufacturing 7 (1994), pp. 193-201.
    • (1994) IEEE Transactions on Semiconductor Manufacturing , vol.7 , pp. 193-201
    • Butler, S.W.1    Stefani, J.A.2
  • 2
    • 0033321365 scopus 로고    scopus 로고
    • Long run and transient analysis of a double EWMA feedback controller
    • E. Del Castillo, "Long run and transient analysis of a double EWMA feedback controller," IIE Transactions 31 (1999), pp. 1157-1169.
    • (1999) IIE Transactions , vol.31 , pp. 1157-1169
    • Del Castillo, E.1
  • 3
    • 0001545483 scopus 로고    scopus 로고
    • Some properties of EWMA feedback quality adjustment schemes for drifting disturbances
    • E. Del Castillo, "Some properties of EWMA feedback quality adjustment schemes for drifting disturbances," J. Quality Techn. 33(2) (2001), pp. 153-166.
    • (2001) J. Quality Techn. , vol.33 , Issue.2 , pp. 153-166
    • Del Castillo, E.1
  • 4
    • 0036887726 scopus 로고    scopus 로고
    • A multivariate double EWMA process adjustment scheme for drifting processes
    • E. Del Castillo and R. Rajagopal, "A multivariate double EWMA process adjustment scheme for drifting processes," IIE Transactions 34(12) (2002), pp. 1055-1068.
    • (2002) IIE Transactions , vol.34 , Issue.12 , pp. 1055-1068
    • Del Castillo, E.1    Rajagopal, R.2
  • 5
    • 0032070696 scopus 로고    scopus 로고
    • An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes
    • E. Del Castillo and J. Yeh, "An adaptive run-to-run optimizing controller for linear and nonlinear semiconductor processes," IEEE Transactions on Semiconductor Manufacturing 11 (1998), pp. 285-295.
    • (1998) IEEE Transactions on Semiconductor Manufacturing , vol.11 , pp. 285-295
    • Del Castillo, E.1    Yeh, J.2
  • 9
    • 0036604555 scopus 로고    scopus 로고
    • A study of a multivariate EWMA controller
    • S. T. Tseng, R. J. Chou and S. P. Lee, "A study of a multivariate EWMA controller," IIE Transactions 34(6) (2002), pp. 541-550.
    • (2002) IIE Transactions , vol.34 , Issue.6 , pp. 541-550
    • Tseng, S.T.1    Chou, R.J.2    Lee, S.P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.