Inspection Capability of High-transmittance HTPSM and OPC masks for ArF Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 446-453

  Tateno, Motonari ^a   Takayama, Naohisa ^a   Murakami, Shingo ^a   Hatta, Keiichi ^a   Akima, Shinji ^b   Matsuo, Fuyuhiko ^b   Otaki, Masao ^b   Kim, Byung Gook ^c   Tanaka, Keishi ^c   Yoshioka, Nobuyuki ^c  

^a NEC CORPORATION   (Japan)

^b TOPPAN PRINTING CO LTD   (Japan)

^c SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

DUV inspection; LM7000; Mask inspection system; Printability; Programmed defect mask

Indexed keywords

DATABASE SYSTEMS; DEFECTS; IMAGE ANALYSIS; LASER BEAM EFFECTS; LIGHT REFLECTION; LIGHT TRANSMISSION; OPACITY; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; SCANNING; SENSITIVITY ANALYSIS; X RAY ANALYSIS;

DUV INSPECTION; LM7000; MASK INSPECTION SYSTEMS; PRINTABILITY; PROGRAMMED DEFECT MASK;

MASKS;

EID: 1642433088     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504206     Document Type: Conference Paper

References (3)

1. B.G.Kim, et al., Proc. of SPIE Vol.4754, p517-525 (2002)
2. B.G.Kim, et al., Proc. of SPIE Vol.4889, p993-1000 (2002)
3. I.Yonekura, et al., Proc. of SPIE Vol.4409, p204-211 (2001)