Pattern shape analysis tool for quantitative estimate of photomask and process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue , 2001, Pages 204-211

  Yonekura, I ^a   Fukushima, Y ^a   Matsuo, F ^a   Otaki, M ^a   Fukugami, N ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE PROCESSING; OPTICAL MICROSCOPY; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY;

PATTERN SHAPE ANALYSIS TOOL; PHOTOMASK PATTERN;

MASKS;

EID: 0035185092     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.438360     Document Type: Conference Paper

References (0)