Inspectability and lithographic effects of reticle defects under aggressive OPC environment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 993-1000

  Kim, Byung Gook ^a   Tanaka, Keishi ^a   Yoshioka, Nobuyuki ^a   Hatta, Keiichi ^b   Otaki, Masao ^c  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NEC CORPORATION   (Japan)

^c Toppan Printing   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION; INTEGRATED CIRCUIT MANUFACTURE; MASKS;

RETICLE DEFECTS;

LITHOGRAPHY;

EID: 0037965868     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467902     Document Type: Conference Paper

References (1)

1. B.G.KIM et al, "Required performances of reticle inspection system for ArF lithography", SPIE 4754, pp 517-525, (2002).