Soft molding lithography of conjugated polymers

Applied Physics Letters

Volumn 84, Issue 8, 2004, Pages 1365-1367

  Pisignano, Dario ^a,c   Persano, Luana ^a   Cingolani, Roberta ^a   Gigli, Giuseppe ^a   Babudri, Francesco ^b   Farinola, Gianluca M ^b   Naso, Francesco ^b  

^a NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

^b UNIVERSITY OF BARI   (Italy)

^c UNIVERSITY OF SALENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEGRADATION; ELECTRON BEAM LITHOGRAPHY; GLASS TRANSITION; LIGHT REFLECTION; MOLDING; PHOTOLUMINESCENCE; QUANTUM EFFICIENCY; RELAXATION PROCESSES; VISCOSITY;

BRAGG SCATTERING; SOFT MOLDING (SM) LITHOGRAPHY;

ORGANIC POLYMERS;

EID: 1642344598     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1644921     Document Type: Article

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