Fabrication of high-fill-factor photonic crystal devices on silicon-on-insulator substrates

Journal of Microlithography, Microfabrication and Microsystems

Volumn 2, Issue 4, 2003, Pages 248-254

  Venkataraman, Sriram ^a   Murakowski, Janusz ^a   Adam, Thomas N ^a   Kolodzey, James ^a   Prather, Dennis W ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

Deep reactive ion etching; Finite difference time domain; Photonic crystals; Reactive ion etching; Silicon on insulator

Indexed keywords

EID: 1642330274     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1610477     Document Type: Article

References (26)

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