Fabrication of high aspect ratio photonic bandgap structures on silicon-on-insulator

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3936, Issue , 2000, Pages 33-39

  Naydenkov, Mikhail ^a   Jalali, Bahram ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; CMOS INTEGRATED CIRCUITS; ELECTRON BEAM LITHOGRAPHY; LIGHT MODULATION; OPTICAL WAVEGUIDES; OPTOELECTRONIC DEVICES; REACTIVE ION ETCHING; REFRACTIVE INDEX;

DEEP REACTIVE ION ETCHING (DRIE); ELECTRON BEAM WRITING; PHOTONIC BANDGAP STRUCTURES;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0033877941     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (11)