Halogen anion formation in 5-halouracil films: X rays compared to subionization electrons

Radiation Research

Volumn 151, Issue 2, 1999, Pages 177-187

  Klyachko, Dimitri V ^a   Huels, Michael A ^a   Sanche, Léon ^a  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

5 BROMOURACIL; ANION; FLUOROURACIL; HALOGEN; IDOXURIDINE; URACIL DERIVATIVE;

ARTICLE; DISSOCIATION; ELECTRON RADIATION; HALOGENATION; IONIZING RADIATION; PRIORITY JOURNAL; RADIOSENSITIZATION; THERMODYNAMICS; X RAY FILM;

ANIONS; BROMOURACIL; CHEMISTRY, PHYSICAL; ELECTRONS; FLUOROURACIL; RADIATION-SENSITIZING AGENTS; URACIL; X-RAYS;

EID: 0032891585     PISSN: 00337587     EISSN: None     Source Type: Journal    
DOI: 10.2307/3579768     Document Type: Article

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